Abstract of Talk by Juan Meza

Optimal Design and Control of Chemical Vapor Deposition Reactors

Juan C. Meza                                
Sandia National Laboratories                
P.O. Box 969                                
MS 9214	                                    
Livermore, CA 94551-0969		    

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The optimal design and control of a chemical vapor deposition (CVD) reactor is an important issue in the microelectronics industry. In the optimal control problem, the goal is to determine a set of parameters that will yield a target temperature distribution in a CVD reactor. In this talk, we examine the issues of using optimization methods for the design and control of CVD reactors for which the objective function is expensive, noisy, and derivatives are not readily available.

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